Partner offer (competences/expertise)
Gas flow sputtering (GFS) is a physical vapour deposition (PVD) technique which is particularly suitable for metal and oxide coatings, for multiphase coatings, nano-structured materials with film thicknesses up to 10 microns or more. The biggest advantage of GFS compared to other vapour deposition techniques like thermal evaporation, magnetron sputtering or thermal spraying, is a very high deposition rate. Besides it has a high stability in the reactive process mode and the ability to deposit coatings with tailored porosity. Furthermore clusters and nanoparticles can be generated in-situ.
We are aiming mainly at the call "FoF.NMP.2011-6 Manufacturing chains for nano-phased components and coatings". The gas flow sputtering is a mature technology approved in many research and industrial trials. It shows very good options for developing and up-scaling to a high-throughput, cost-efficient process and for integration in a micro-macro manufacturing chain for the production of new products with nano-materials.
Topics
FoF.NMP.2011-6:
Manufacturing chains for nano-phased components and coatings - LARGE
Contact
Dr.-Ing. Jan Gaebler
Fraunhofer Institute for Surface Engineering and Thin Films IST
Bienroder Weg 54 E
38108 Braunschweig
Homepage: http://www.ist.fraunhofer.de
Email: jan.gaebler@ist.fraunhofer.de
Phone: +40 531 2155 625
Organisation: Research Organization
Responsible NCP
Ingo Rey
Forschungszentrum Jülich GmbH
i.rey@fz-juelich.de
Telephone:+49-2461-612623
Telefax:+49-2461-612398
Germany
